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For the Inventor, By the Inventor

Shanghai, China

Sunny Voha Nuch

This inventor holds 4 USPTO granted patents. Top assignee: Acm Research (Shanghai) Inc.. Active years: 2016-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sunny Voha Nuch. Retrieved from https://idiyas.com/inventor/sunny-voha-nuch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4

% Patents Active = 100.0

Average Co-Inventor Count = 8.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:

goldMedal4 out of 73 
 
Acm Research (Shanghai) Inc.
 patents

Years Active: 2016-2018

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4 patents (USPTO):Explore Patents
1. 10020208 - Methods and apparatus for cleaning semiconductor wafers (2018-07-10),
2. 9633833 - Methods and apparatus for cleaning semiconductor wafers (2017-04-25),
3. 9595457 - Methods and apparatus for cleaning semiconductor wafers (2017-03-14),
4. 9492852 - Methods and apparatus for cleaning semiconductor wafers (2016-11-15),

Title: The Innovative Journey of Sunny Voha Nuch

Introduction: Sunny Voha Nuch is a pioneering inventor based in Shanghai, China, known for her groundbreaking contributions to various technological fields.

Latest Patents: Sunny Voha Nuch's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles and innovative solutions for sustainable energy production.

Career Highlights: With a career spanning over two decades, Sunny Voha Nuch has worked with leading research institutions and tech companies to bring her inventions to life. Her dedication to pushing the boundaries of technology has earned her recognition in the industry.

Collaborations: Throughout her career, Sunny Voha Nuch has collaborated with top engineers, scientists, and designers to develop cutting-edge products that have revolutionized the way we interact with technology.

Conclusion: Sunny Voha Nuch's passion for innovation and relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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