Sungwon Kim

Title: Innovations by Inventor Sungwon Kim

Introduction

Sungwon Kim is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of photolithography, particularly in the design and modeling of masks used in semiconductor manufacturing. With a total of 3 patents, his work has advanced the technology used in the production of integrated circuits.

Latest Patents

Sungwon Kim's latest patents include innovative methods for improving mask layout patterns in phase shift photolithography masks. One of his patents focuses on decomposing a photolithography mask layout into primitives, identifying jogs characterized by three adjacent corners, and synthesizing an electric field at a substrate to correct the mask layout. Another patent describes a comprehensive approach to mask design and modeling for a set of masks that are successively imaged to print composite patterns on substrates, such as semiconductor wafers. This includes methods for double patterning and correcting drawn patterns based on predicted contours.

Career Highlights

Sungwon Kim is currently employed at Intel Corporation, where he applies his expertise in photolithography to enhance semiconductor manufacturing processes. His work has been instrumental in developing advanced techniques that improve the efficiency and accuracy of mask designs.

Collaborations

Throughout his career, Sungwon has collaborated with talented individuals such as Bin Hu and Vivek K Singh. These collaborations have contributed to the successful development of innovative solutions in the field of semiconductor technology.

Conclusion

Sungwon Kim's contributions to photolithography and semiconductor manufacturing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of complex processes and a drive to improve technology in the industry.