Sung-Un Kwean

Title: Innovations of Sung-Un Kwean

Introduction

Sung-Un Kwean is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of etching processes. With a total of 5 patents to his name, Kwean has demonstrated a commitment to advancing innovative techniques in his industry.

Latest Patents

One of Kwean's latest patents is a method of forming a mask having a nitride film. This method involves creating a mask layer that includes nitrogen, followed by the formation of a photoresist pattern on the mask layer. The mask layer is then etched using a mixed gas that includes a first gas for etching the mask layer and a second gas to enhance the selectivity of the photoresist pattern. This innovative approach improves the selectivity of the photoresist while maintaining a high etching ratio of the nitride layer during the formation of a hard mask.

Another significant patent by Kwean is related to an etching gas composition for silicon oxide and a method of etching silicon oxide using this composition. The etching gas consists primarily of a carbon fluoride gas, where the ratio of fluorine atoms to carbon atoms is less than 2, along with an auxiliary fluorohydrocarbon gas containing hydrogen, fluorine, and carbon atoms. This composition allows for efficient and precise etching of silicon oxide, increasing the etching selectivity of an oxide layer formed of silicon oxide with respect to photoresist. The method enables the manufacturing of contact holes with high aspect ratios and excellent profiles, even when using a thin photoresist layer.

Career Highlights

Sung-Un Kwean is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to apply his innovative ideas and contribute to the development of advanced semiconductor technologies. Kwean's expertise in etching processes has positioned him as a valuable asset within the company.

Collaborations

Kwean has collaborated with Jae-Seung Hwang, a fellow innovator in the field. Their partnership has likely fostered the exchange of ideas and techniques, further enhancing their contributions to semiconductor technology.

Conclusion

Sung-Un Kwean's innovative work in the semiconductor industry, particularly in etching processes