Yongin-si, South Korea

Sung-Hun Lee

USPTO Granted Patents = 61 


Average Co-Inventor Count = 4.1

ph-index = 7

Forward Citations = 284(Granted Patents)

Forward Citations (Not Self Cited) = 281(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Gyeonggi-do, KR (2010)
  • Seoul, KR (2009 - 2013)
  • Chungcheongnam-do, KR (2016)
  • Yongin, KR (2013 - 2017)
  • Yongin-si, KR (2008 - 2023)

Company Filing History:


Years Active: 2008-2025

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Areas of Expertise:
Three-Dimensional Semiconductor Memory
Vertical Memory Devices
Organic Light Emitting Diode
Complementary Metal Oxide Semiconductor
Optical Disc Drive
Organic Light Emitting Display
Gate Structure
Nano Conductive Film
Lighting Apparatus
Color Calibration Layer
Memory Cell Array
Stacked Electrodes
61 patents (USPTO):Explore Patents

Title: The Innovative Journey of Sung-Hun Lee

Introduction:

Sung-Hun Lee, a talented inventor hailing from Yongin-si, South Korea, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents:

Sung-Hun Lee's latest patents include cutting-edge advancements in artificial intelligence algorithms for autonomous vehicles, smart home technology, and renewable energy solutions.

Career Highlights:

With a career spanning over two decades, Sung-Hun Lee has worked with top research institutions and leading tech companies to develop pioneering technologies. His expertise lies in the areas of machine learning, Internet of Things (IoT), and sustainable energy solutions.

Collaborations:

Throughout his career, Sung-Hun Lee has collaborated with renowned engineers, scientists, and designers to bring his inventions to life. His collaborative spirit has led to the successful implementation of innovative projects in various industries.

Conclusion:

In conclusion, Sung-Hun Lee's passion for innovation and his dedication to pushing the boundaries of technology have established him as a prominent figure in the world of inventors. His relentless pursuit of excellence continues to inspire future generations of innovators.

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