Sung-Hun Chi

Title: Innovations by Sung-Hun Chi in Semiconductor Technology

Introduction

Sung-Hun Chi is a notable inventor based in Seoul, South Korea, recognized for his contributions to semiconductor technology. He holds a total of 3 patents that focus on improving the reliability and efficiency of semiconductor devices. His innovative approaches have made significant impacts in the field.

Latest Patents

One of his latest patents is a "Plug forming method for semiconductor device." This method involves forming an insulation layer in a semiconductor substrate, creating an opening on a predetermined surface, and applying a polysilicon layer. The process utilizes a compound gas mixed with fluorine and either nitrogen or oxygen, which reduces etching loading effects and plug loss, ultimately enhancing the reliability of the semiconductor device.

Another significant patent is the "Dry etching method of multilayer film." This method includes multiple steps for etching a metallic layer using a compound gas plasma. It prevents undercut generation along the sidewalls and minimizes residues in the substrate. This innovative approach not only improves the reliability of semiconductor devices but also reduces fabrication time and costs.

Career Highlights

Sung-Hun Chi has worked with prominent companies in the semiconductor industry, including Hyundai Electronics Industries Co., Ltd. and LG Semicon Co., Ltd. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

He has collaborated with various professionals in the field, including his coworker Jae-Hee Ha, to further advance semiconductor innovations.

Conclusion

Sung-Hun Chi's contributions to semiconductor technology through his patents demonstrate his commitment to enhancing device reliability and efficiency. His work continues to influence the industry positively.