Seoul, South Korea

Sung Hoon Choa

This inventor holds 4 USPTO granted patents. Top assignees: Samsung Electronics Co., Ltd., Seagate Technology Incorporated. Active years: 2010-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Hoon Choa. Retrieved from https://idiyas.com/inventor/sung-hoon-choa-yy3yeg65

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 25.0

Average Co-Inventor Count = 5.2

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2010-2015

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4 patents (USPTO):Explore Patents

Title: Innovations of Sung Hoon Choa

Introduction

Sung Hoon Choa is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of nano-imprint lithography, holding a total of 4 patents. His work has been instrumental in advancing technologies that utilize ultraviolet light for precise manufacturing processes.

Latest Patents

One of his latest patents is a process and apparatus for ultraviolet nano-imprint lithography. This innovation provides a method for performing UV nano-imprint lithography using a polymer pad. The polymer pad allows for a uniform application of pressure to a patterned template, facilitating the easy removal of a residual resin layer. Additionally, the apparatus features a tilt and decentering corrector, which ensures accurate alignment of layers during the nano-imprint lithography process.

Career Highlights

Sung Hoon Choa has worked with notable companies such as Samsung Electronics Co., Ltd. and Seagate Technology Incorporated. His experience in these leading technology firms has contributed to his expertise in the field of nano-imprint lithography.

Collaborations

Some of his coworkers include Eun-Hyoung Cho and Jin Seung Sohn. Their collaborative efforts have further enhanced the innovations in the technologies they have developed together.

Conclusion

Sung Hoon Choa's contributions to the field of nano-imprint lithography demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in advanced manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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