The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Nov. 17, 2011
Applicants:
Eun-hyoung Cho, Seoul, KR;
Sung Hoon Choa, Seoul, KR;
Jin Seung Sohn, Seoul, KR;
Byung Kyu Lee, Seoul, KR;
Du Hyun Lee, Suwon-si, KR;
Inventors:
Eun-Hyoung Cho, Seoul, KR;
Sung Hoon Choa, Seoul, KR;
Jin Seung Sohn, Seoul, KR;
Byung Kyu Lee, Seoul, KR;
Du Hyun Lee, Suwon-si, KR;
Assignee:
Seagate Technology LLC, Cupertino, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/16 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.