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For the Inventor, By the Inventor

Seoul, South Korea

Eun-Hyoung Cho

This inventor holds 25 USPTO granted patents and 5 published patent applications and 1 EPO patent, primarily in Nano-Imprint Lithography. Top assignees: Samsung Electronics Co., Ltd., Seagate Technology Incorporated, Samsung Electro-Mechanics Co., Ltd.. Active years: 2006-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eun-Hyoung Cho. Retrieved from https://idiyas.com/inventor/eun-hyoung-cho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 36.0

 

Average Co-Inventor Count = 4.3

ph-index = 5

Forward Citations = 148(Granted Patents)


Company Filing History:

goldMedal19 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents
silverMedal3 out of 8,750 
 
Seagate Technology Incorporated
 patents
bronzeMedal2 out of 7,633 
 
Samsung Electro-Mechanics Co., Ltd.
 patents
4. 1 out of 66 
 
Seagate Technology International
 patents

Years Active: 2006-2015

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Areas of Expertise:
Ultraviolet Nano-Imprint Lithography
Photonic Crystal Optical Filter
Waveguide
Information Storage Devices
Heat-Assisted Magnetic Recording
Micro-Lens Array
Optical System
Integrated Optical Pickup
Alignment Mark
Light Delivery Module
Optical Disc Drive
Aberration Correction
25 patents (USPTO):Explore Patents
1. 9186700 - Process and apparatus for ultraviolet nano-imprint lithography (2015-11-17),
2. 9105285 - Waveguide having a metal alignment mark (2015-08-11),
3. 8562891 - Process and apparatus for ultraviolet nano-imprint lithography (2013-10-22),
4. 8363185 - Photonic crystal optical filter, transmissive color filter, transflective color filter, and display apparatus using the color filters (2013-01-29),
5. 8339829 - Information storage devices using movement of magnetic domain walls and methods of manufacturing the same (2012-12-25),
6. 8264637 - Photonic crystal optical filter, reflective color filter, display apparatus using the reflective color filter, and method of manufacturing the reflective color filter (2012-09-11),
7. 8225482 - Manufacturing method of waveguide having a metal alignment mark (2012-07-24),
8. 8087920 - Process and apparatus for ultraviolet nano-imprint lithography (2012-01-03),
9. 7957175 - Information storage devices using movement of magnetic domain walls and methods of manufacturing the same (2011-06-07),
10. 7944782 - 90°-bent metallic waveguide having tapered c-shaped aperture, method of fabricating the waveguide, light delivery module including the waveguide, and heat assisted magnetic recording head having the waveguide (2011-05-17),
11. 7858010 - Soft template with alignment mark (2010-12-28),
12. 7798802 - Dual-side imprinting lithography system (2010-09-21),
13. 7710686 - Heat-assisted magnetic recording head and method of manufacturing the same (2010-05-04),
14. 7688684 - Heat-assisted magnetic recording head and recording apparatus including the same (2010-03-30),
15. 7663982 - Light delivery module, method of fabricating the same and heat-assisted magnetic recording head using the light delivery module (2010-02-16),

Title: **Eun-Hyoung Cho: A Pioneer in Ultraviolet Nano-Imprint Lithography**

Introduction

Eun-Hyoung Cho, based in Seoul, South Korea, is a prominent inventor known for his innovative contributions to the field of nano-imprint lithography. With an impressive portfolio of 25 patents to his name, he has made significant advancements in technology that support the development of more efficient manufacturing processes.

Latest Patents

Among his recent achievements, Eun-Hyoung Cho has developed two notable patents. The first is a **Process and Apparatus for Ultraviolet Nano-Imprint Lithography**, which introduces a polymer pad designed to ensure uniform pressure application to a patterned template, while facilitating the easy removal of residual resin. The incorporated apparatus features a tilt and decentering corrector, which aids in achieving accurate layer alignment during the lithography process. The second patent, titled **Waveguide Having a Metal Alignment Mark**, encompasses a waveguide structure that comprises a metal layer of specific dimensions situated on a substrate. This innovative structure also includes a lower clad layer completely covering the metal layer, a core layer positioned above it, and an upper clad layer that envelops the core layer entirely.

Career Highlights

Eun-Hyoung Cho has held prominent roles in esteemed organizations, notably at Samsung Electronics Co., Ltd. and Seagate Technology Incorporated. His work within these companies has solidified his reputation as a leading figure in the advancement of technology related to photolithography and waveguide structures.

Collaborations

Throughout his career, Eun-Hyoung Cho has collaborated with talented professionals, including Jin-Seung Sohn and Hae-sung Kim. These partnerships have fostered a creative environment conducive to the development of groundbreaking technologies and innovations.

Conclusion

Eun-Hyoung Cho's contributions to the field of nano-imprint lithography through his inventions and patents underscore his role as a key innovator in the industry. His work not only enhances manufacturing efficiency but also paves the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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