The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
Oct. 22, 2013
Applicant:
Seagate Technology Llc, Cupertino, CA (US);
Inventors:
Eun-Hyoung Cho, Seoul, KR;
Sung Hoon Choa, Seoul, KR;
Jin Seung Sohn, Seoul, KR;
Byung Kyu Lee, Seoul, KR;
Du Hyun Lee, Suwon-si, KR;
Assignee:
SEAGATE TECHNOLOGY LLC, Cupertino, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/02 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); B29C 47/92 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
B05D 5/02 (2013.01); B29C 47/92 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/00 (2013.01); Y10S 977/887 (2013.01);
Abstract
A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.