Subramanya Mayya

Title: Subramanya Mayya: Innovator in Microelectronics

Introduction

Subramanya Mayya is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of microelectronics, holding a total of 5 patents. His work focuses on advanced methods for forming photoresist patterns and nano line structures in microelectronic devices.

Latest Patents

One of his latest patents is titled "Methods of forming photoresist patterns." This invention may include forming a photoresist layer on a substrate, exposing the photoresist layer using an exposure mask, forming a preliminary pattern by developing the exposed photoresist layer, and treating a surface of the preliminary pattern using a treatment agent that includes a coating polymer. Another notable patent is "Nano line structures in microelectronic devices." This method involves forming a groove structure with opposing sidewalls and a surface on a substrate to define a nano line arrangement region. The nano line arrangement region has a predetermined width and a predetermined length greater than the width. At least one nano line is formed in this region, extending substantially along its length and coupled to the surface of the groove structure to define a nano line structure.

Career Highlights

Subramanya Mayya is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of microelectronics. His work has been instrumental in advancing technologies that are crucial for modern electronic devices.

Collaborations

He has collaborated with notable colleagues, including Xiaofeng Wang and ZongLiang Huo, contributing to various projects that enhance the capabilities of microelectronic devices.

Conclusion

Subramanya Mayya's contributions to microelectronics through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence the development of advanced electronic technologies.