The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2011

Filed:

Sep. 11, 2007
Applicants:

Zongliang Huo, Gyeonggi-do, KR;

Subramanya Mayya, Gyeonggi-do, KR;

Xiaofeng Wang, Gyeonggi-do, KR;

In-seok Yeo, Seoul, KR;

Inventors:

ZongLiang Huo, Gyeonggi-do, KR;

Subramanya Mayya, Gyeonggi-do, KR;

Xiaofeng Wang, Gyeonggi-do, KR;

In-Seok Yeo, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/8236 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming a microelectronic device includes forming a groove structure having opposing sidewalls and a surface therebetween on a substrate to define a nano line arrangement region. The nano line arrangement region has a predetermined width and a predetermined length greater than the width. At least one nano line is formed in the nano line arrangement region extending substantially along the length thereof and coupled to the surface of the groove structure to define a nano line structure. Related devices are also discussed.


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