Albany, NY, United States of America

Stuart A Sieg

USPTO Granted Patents = 2 

Average Co-Inventor Count = 6.2

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):

Title: Innovations and Contributions of Stuart A. Sieg

Introduction

Stuart A. Sieg, an accomplished inventor based in Albany, NY, has made significant contributions to the semiconductor industry. With a portfolio of two patents, he has developed innovative methods that address critical challenges in semiconductor manufacturing.

Latest Patents

Stuart's latest patents showcase his expertise in advanced semiconductor processes. One of his notable inventions is the "Alternating hardmasks for tight-pitch line formation," which presents a method for forming fins using a three-color hardmask fin pattern on a fin base layer. This process allows for selective etching of fins based on their color, ensuring precise etching while minimizing material loss.

Another significant patent by Stuart is the "Structure and process to tuck fin tips self-aligned to gates." This invention provides a semiconductor structure that features a fin portion extending from a substrate with a gate structure positioned above it. This design incorporates gate spacers that enhance the alignment and performance of the semiconductor device.

Career Highlights

Throughout his career, Stuart has worked with leading companies in the semiconductor sector, including Tessera LLC and Adeia Semiconductor Solutions LLC. His experience in these organizations has equipped him with the knowledge and skills necessary to innovate and improve semiconductor technologies.

Collaborations

Stuart has collaborated with talented professionals in the field, including his coworker Hong He. These collaborations have fostered an environment of innovation and have contributed to the successful development of cutting-edge semiconductor solutions.

Conclusion

Stuart A. Sieg's contributions to the semiconductor industry through his patents demonstrate his dedication to innovation and excellence. His work not only advances technological capabilities but also sets a foundation for future advancements in semiconductor manufacturing. Stuart's inventive spirit and collaborative efforts mark him as a noteworthy figure in the realm of semiconductor inventions.

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