Steven W Johnston

Title: The Innovations of Steven W Johnston

Introduction

Steven W Johnston is a prominent inventor based in Portland, OR (US). He has made significant contributions to the field of technology, particularly in the area of semiconductor manufacturing. With a total of 14 patents to his name, Johnston's work has had a lasting impact on the industry.

Latest Patents

One of Johnston's latest patents is focused on forming a copper diffusion barrier. This innovation utilizes noble metals as a non-oxidizing diffusion barrier to prevent diffusion from copper lines. The diffusion barrier can be created using a noble metal over an adhesion promoting layer or as a noble metal cap over an oxidizable diffusion barrier. Additionally, the copper lines may be covered with a noble metal to enhance performance. Another notable patent describes a method of making a bottomless via. This method involves forming an opening in a dielectric layer on a substrate, followed by the creation of a barrier layer on the opening. A seed layer, which includes a noble metal copper alloy, is then formed on the barrier layer, with the copper having less than 50% of the atomic weight of the noble metal copper alloy.

Career Highlights

Johnston is currently employed at Intel Corporation, where he continues to innovate and develop new technologies. His work at Intel has positioned him as a key player in advancing semiconductor technology.

Collaborations

Throughout his career, Johnston has collaborated with notable colleagues, including Juan E Dominguez and Kevin O'Brien. These partnerships have contributed to the success of his projects and the advancement of technology in the semiconductor field.

Conclusion

Steven W Johnston's contributions to the field of technology through his patents and work at Intel Corporation highlight his role as an influential inventor. His innovative approaches to semiconductor manufacturing continue to shape the industry.