Steven Reiter

Title: Innovations by Steven Reiter

Introduction

Steven Reiter is an accomplished inventor based in Santa Clara, CA. He holds 2 patents that showcase his expertise in the field of semiconductor technology. His work primarily focuses on enhancing the mechanical strength and adhesion properties of dielectric layers.

Latest Patents

One of his latest patents is titled "Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength." This patent discloses a structure that includes a SiCOH layer with improved mechanical strength. The structure comprises a substrate with a dielectric or conductive material layer, an oxide layer devoid of carbon, and a graded transition layer that gradually increases carbon content towards a porous SiCOH layer. The method ensures that there are no peaks in carbon concentration and no dips in oxygen concentration within the graded transition layer.

Another significant patent is "Interface engineering to improve adhesion between low k stacks." This method involves depositing an organosilicate dielectric layer that exhibits high adhesion strength to an underlying substrate within a single processing chamber. The process includes positioning a substrate in a chamber, flowing an interface gas mixture, and depositing a silicon oxide layer while maintaining a DC bias of less than 60 volts.

Career Highlights

Steven Reiter has worked with notable companies such as Applied Materials, Inc. and IBM. His experience in these organizations has contributed to his innovative approaches in semiconductor technology.

Collaborations

Throughout his career, Steven has collaborated with talented individuals, including Deenesh Padhi and Ganesh Balasubramanian. These collaborations have further enriched his work and led to advancements in his field.

Conclusion

Steven Reiter's contributions to semiconductor technology through his patents and collaborations highlight his significant role as an inventor. His innovative methods continue to influence the industry and pave the way for future advancements.