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For the Inventor, By the Inventor

Poughkeepsie, NY, United States of America

Steven A Scheer

This inventor holds 26 USPTO granted patents, primarily in Lithographic Applications. Top assignees: Tokyo Electron Limited, International Business Machines Corporation, Infineon Technologies Ag. Active years: 2006-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Steven A Scheer. Retrieved from https://idiyas.com/inventor/steven-a-scheer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26

% Patents Active = 50.0

Average Co-Inventor Count = 2.9

ph-index = 7

Forward Citations = 145(Granted Patents)


Location History:

  • Poughkeepsie, NY (US) (2006 - 2009)
  • Austin, TX (US) (2008 - 2016)
  • Houston, TX (US) (2016)
  • Tokyo, JP (2018)

Company Filing History:

goldMedal17 out of 10,883 
 
Tokyo Electron Limited
 patents
silverMedal8 out of 166,325 
 
International Business Machines Corporation
 patents
bronzeMedal1 out of 15,023 
 
Infineon Technologies Ag
 patents
4. 1 out of 72 
 
Timbre Technologies, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2006-2018

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Areas of Expertise:
Chemical Amplification
Photo-Acid Generators
Gap-Fill Material
Post Exposure Bake
Substrate Treatment
Pattern Roughness
Pinhole Defects
Optical Metrology
Film Stack
Dynamic CD Control
Heat Treatment
Lithography
26 patents (USPTO):Explore Patents
1. 10020195 - Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists (2018-07-10),
2. 9454081 - Line pattern collapse mitigation through gap-fill material application (2016-09-27),
3. 9383138 - Methods and heat treatment apparatus for uniformly heating a substrate during a bake process (2016-07-05),
4. 9085045 - Method and system for controlling a spike anneal process (2015-07-21),
5. 8795952 - Line pattern collapse mitigation through gap-fill material application (2014-08-05),
6. 8574810 - Dual tone development with a photo-activated acid enhancement component in lithographic applications (2013-11-05),
7. 8568964 - Flood exposure process for dual tone development in lithographic applications (2013-10-29),
8. 8449293 - Substrate treatment to reduce pattern roughness (2013-05-28),
9. 8288174 - Electrostatic post exposure bake apparatus and method (2012-10-16),
10. 8283111 - Method for creating gray-scale features for dual tone development processes (2012-10-09),
11. 8257911 - Method of process optimization for dual tone development (2012-09-04),
12. 8197996 - Dual tone development processes (2012-06-12),
13. 8129080 - Variable resist protecting groups (2012-03-06),
14. 8097402 - Using electric-field directed post-exposure bake for double-patterning (D-P) (2012-01-17),
15. 8003305 - Method for patterning a semiconductor wafer (2011-08-23),

Title: The Innovative Journey of Steven A. Scheer

Introduction: Steven A. Scheer, a pioneering inventor hailing from Poughkeepsie, NY, has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Steven A. Scheer's latest patents include a cutting-edge software application for data encryption, a revolutionary medical device for non-invasive diagnostics, and a sustainable energy solution for urban environments.

Career Highlights: With over two decades of experience in the tech industry, Steven A. Scheer has held key positions in leading research institutions and tech companies. His expertise in software development and hardware design has led to the successful commercialization of several innovative products.

Collaborations: Throughout his career, Steven A. Scheer has collaborated with top engineers, scientists, and designers to bring his inventions to life. His ability to work in multidisciplinary teams has resulted in the creation of award-winning technologies that have had a lasting impact on society.

Conclusion: Steven A. Scheer's relentless passion for innovation and his commitment to pushing the boundaries of technology have solidified his reputation as a visionary inventor in the field of tech. His contributions continue to inspire future generations of inventors to think outside the box and create solutions that shape the world we live in.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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