Steffen Frigge

Title: Steffen Frigge: Innovator in Semiconductor Technology

Introduction

Steffen Frigge is a notable inventor based in Chemnitz, Germany, recognized for his contributions to semiconductor technology. With a total of two patents to his name, Frigge has made significant advancements in the thermal treatment of semiconductor wafers.

Latest Patents

Frigge's latest patents include a device and method for thermally treating semiconductor wafers. This innovative device is designed to treat substrates with at least one silicon layer and a metal layer, such as tungsten, which should not be oxidized. The device features at least one radiation source and a treatment chamber that is substantially transparent to the radiation, ensuring effective treatment without contamination. His second patent focuses on minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates. This method employs a hydrogen-containing, nonaqueous inert gas to prevent or reduce vapor deposition during the oxidation process.

Career Highlights

Throughout his career, Steffen Frigge has worked with prominent companies in the semiconductor industry, including Mattson Thermal Products GmbH and Infineon Technologies AG. His experience in these organizations has contributed to his expertise in semiconductor processing and innovation.

Collaborations

Frigge has collaborated with notable colleagues such as Georg Roters and Regina Hayn, further enhancing his work in the field of semiconductor technology.

Conclusion

Steffen Frigge's contributions to semiconductor technology through his patents and career achievements highlight his role as an innovator in the industry. His work continues to influence advancements in the thermal treatment of semiconductor wafers.