The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Oct. 27, 2003
Olaf Storbeck, Dresden, DE;
Wilhelm Kegel, Langebrück, DE;
Jens-uwe Sachse, Dresden, DE;
Michael Stadtmüller, Dresden, DE;
Regina Hayn, Baernsdorf, DE;
Erwin Schoer, Dresden, DE;
Georg Roters, Dülmen, DE;
Steffen Frigge, Chemnitz, DE;
Olaf Storbeck, Dresden, DE;
Wilhelm Kegel, Langebrück, DE;
Jens-Uwe Sachse, Dresden, DE;
Michael Stadtmüller, Dresden, DE;
Regina Hayn, Baernsdorf, DE;
Erwin Schoer, Dresden, DE;
Georg Roters, Dülmen, DE;
Steffen Frigge, Chemnitz, DE;
Infineon Technologies AG, Munich, DE;
Abstract
During a selective oxidation of gate structures that includes a polycrystalline silicon layer and a tungsten layer, which is known per se, a vapor deposition of tungsten oxide is prevented or at least greatly reduced by a special process. The gate structure is acted on by a hydrogen-containing, nonaqueous inert gas before and, if appropriate, after a treatment step with a hydrogen/water mixture.