This inventor holds 2 USPTO granted patents. Top assignee: Infineon Technologies Ag. Active years: 2006-2009.
Company Filing History:
Years Active: 2006-2009
Title: Michael Stadtmüller: Innovator in Semiconductor Technology
Introduction
Michael Stadtmüller is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.
Latest Patents
Stadtmüller's latest patents include a trench capacitor structure and a process for applying a covering layer and a mask for trench etching processes in semiconductor substrates. This invention introduces a stress relief layer made from thermally produced silicon nitride, which replaces the conventional silicon dioxide layer. This advancement streamlines the overall processing by reducing restrictions imposed during subsequent process steps, such as wet-etching. His second patent focuses on minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates. This process effectively prevents or greatly reduces tungsten oxide deposition, enhancing the efficiency of gate structure treatments.
Career Highlights
Michael Stadtmüller is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in the industry.
Collaborations
Stadtmüller has collaborated with notable colleagues, including Olaf Storbeck and Henry Bernhardt. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Michael Stadtmüller is a key figure in the semiconductor industry, with a focus on innovative solutions that enhance manufacturing processes. His contributions through patents and collaborations continue to shape the future of technology.