Stefan Glunz

Title: The Innovative Contributions of Stefan Glunz

Introduction

Stefan Glunz is a prominent inventor based in Freiburg, Germany. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to precision processing and electrical contact methods.

Latest Patents

One of his latest patents is a method for the precision processing of substrates. This invention relates to the microstructuring of thin layers, local dopant introduction, and the local application of a metal nucleation layer. It involves the use of a liquid-assisted laser, which allows for laser irradiation of a substrate covered by a suitable reactive liquid in the regions to be processed. Another notable patent is a method of producing a semiconductor-metal contact through a dielectric layer. This method involves electrically contacting a semiconductor layer coated with at least one dielectric layer, where a metal layer is applied and temporarily locally heated in a controlled manner. This process results in a local molten mixture that forms an electrical contact upon solidification.

Career Highlights

Stefan Glunz has worked with esteemed organizations such as the Fraunhofer Society for the Advancement of Applied Research and Albert-Ludwigs-University Freiburg. His work in these institutions has contributed to advancements in semiconductor technology and materials science.

Collaborations

Throughout his career, Stefan has collaborated with notable colleagues, including Ralf Preu and Wolfram Wettling. These partnerships have further enhanced his research and development efforts in the field.

Conclusion

Stefan Glunz's innovative patents and career achievements highlight his significant impact on semiconductor technology. His work continues to influence advancements in precision processing and electrical contact methods.