Boise, ID, United States of America

Srividya Krishnamurthy

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Micron Technology Incorporated. Active years: 2014.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Srividya Krishnamurthy

Introduction

Srividya Krishnamurthy is a notable inventor based in Boise, ID (US). She has made significant contributions to the field of memory cell technology. Her work focuses on methods of forming metal oxide and memory cells, showcasing her expertise and innovative spirit.

Latest Patents

One of her key patents is titled "Methods of forming metal oxide and memory cells." This patent describes methods for depositing metal oxide over a first electrode, which has a relatively low degree of crystallinity. The degree of crystallinity within the metal oxide can be increased after deposition. Additionally, a dielectric material is formed over the metal oxide, followed by the formation of a second electrode. The patent emphasizes that the degree of crystallinity may be enhanced through thermal treatment, which can occur before, during, or after the formation of the dielectric material. Srividya holds 1 patent in this area.

Career Highlights

Srividya is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. Her role at Micron allows her to apply her innovative ideas and contribute to advancements in memory technology.

Collaborations

Throughout her career, Srividya has collaborated with talented individuals such as Dale Collins and Noel Rocklein. These collaborations have further enriched her work and contributed to the success of her projects.

Conclusion

Srividya Krishnamurthy's contributions to the field of memory cell technology highlight her innovative capabilities and dedication to advancing the industry. Her work continues to inspire future developments in semiconductor technology.

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