This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Soya Todo - Innovator in Plasma Processing Technology
Introduction
Soya Todo is a prominent inventor based in Boise, ID (US), known for her contributions to plasma processing technology. With a total of 3 patents, she has made significant advancements in substrate processing methods and apparatuses.
Latest Patents
Her latest patents include a plasma processing method and a plasma processing apparatus. The plasma processing method provides a substrate processing technology with good in-plane uniformity. This method involves disposing a substrate on a substrate support, supplying a processing gas into the chamber, and forming a plasma of the processing gas between the upper and lower electrodes. The process is enhanced by controlling the electric field formed between the electrodes through the supply of RF signals. Additionally, she has developed a prediction method and information processing apparatus for predicting the process result in a plasma etching process. This method calculates the correlation between the spatial distribution of a magnetic field in a chamber and the resulting process outcome on the substrate.
Career Highlights
Soya Todo has established herself as a key figure in her field, working at Tokyo Electron Limited, a leading company in semiconductor manufacturing equipment. Her innovative approaches have contributed to the advancement of plasma processing technologies.
Collaborations
She collaborates with notable coworkers, including Ryohei Takeda and Joji Takayoshi, further enhancing her research and development efforts.
Conclusion
Soya Todo's work in plasma processing technology exemplifies her commitment to innovation and excellence. Her patents reflect her expertise and dedication to advancing the field.