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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12562352 B1

PDFFull Text
Date of Patent:
Feb. 24, 2026

Filed:

Mar. 16, 2023

Prediction method and information processing apparatus for predicting the process result in a plasma etching process

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Keita Yaegashi, Miyagi, JP;

Joji Takayoshi, Miyagi, JP;

Takayuki Suzuki, Miyagi, JP;

Ryohei Takeda, Miyagi, JP;

Soya Todo, Boise, ID (US);

Yusuke Saitoh, Miyagi, JP;

Takaharu Saino, Miyagi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

XSENSUS LLP

Primary Examiner:

Kamini S Shah

Assistant Examiner:

Jonathan Michael Skrzycki

Int. Cl.
CPC ...
H05K 3/00 (2006.01); G05B 19/4099 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32669 (2013.01); G05B 19/4099 (2013.01); G05B 2219/45031 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/3343 (2013.01); H05K 3/0041 (2013.01);
Abstract

A prediction method includes a calculation process and a prediction process. The calculation process calculates a correlation between a spatial distribution value of a magnetic field in a chamber when a plasma etching process is performed on a substrate disposed in the chamber, and a process result of the plasma etching process on the substrate. The prediction process predicts the process result of the plasma etching process on the substrate from the spatial distribution value of the magnetic field in the chamber based on the calculated correlation.

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Yaegashi, Keita. (2026). Prediction method and information processing apparatus for predicting the process result in a plasma etching process (U.S. Patent No. 12562352). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12562352

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