Location History:
- Niigata, JP (2015 - 2018)
- Joetsu, JP (2017 - 2018)
- Echizen, JP (2020)
Company Filing History:
Years Active: 2015-2020
Title: **Inventor Spotlight: Souichi Fukaya**
Introduction
Souichi Fukaya, hailing from Niigata, Japan, has established himself as a prominent figure in the field of photomask technology. With an impressive portfolio of 20 patents, Fukaya's innovations play a crucial role in advancing semiconductor manufacturing processes.
Latest Patents
Fukaya's recent patents highlight his expertise in halftone phase shift photomask blanks. One notable invention includes a halftone phase shift photomask blank featuring a transparent substrate with multiple films. The first film serves as a halftone phase shift film, while the second acts as a light shielding film. The third film is a hard mask film, and the fourth film complements the overall structure. The innovative aspect lies in the choice of materials, as the first and third films consist of silicon-containing materials, which are resistant to chlorine-based dry etching and can be removed by fluorine-based dry etching. Conversely, the second and fourth films are made of silicon-free, chromium-containing materials, resistant to fluorine-based dry etching and removable by chlorine-based dry etching.
Another key patent involves a photomask blank, featuring a transparent substrate and multiple films. Similar to the previous patent, the films utilize silicon and chromium-based materials for enhanced etching resistance and compatibility.
Career Highlights
Souichi Fukaya is currently associated with Shin-Etsu Chemical Co., Ltd., a leader in the chemical industry, known for its advancements in materials used for semiconductor production. His work at this esteemed company is a testament to his dedication to innovation and improving photomask technologies.
Collaborations
In his journey, Fukaya has collaborated with talented coworkers such as Yukio Inazuki and Hideo Nakagawa. These collaborations have likely contributed to the depth of research and development behind many of his patents, fostering a rich environment for innovation.
Conclusion
Souichi Fukaya’s contributions to the field of photomask technology are invaluable, as evidenced by his numerous patents and impactful collaborations. His work not only reflects innovation but also represents a significant advancement in the semiconductor industry, solidifying his reputation as a distinguished inventor.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.