The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Sep. 02, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/38 (2012.01); G03F 1/46 (2012.01); G03F 1/50 (2012.01); G03F 1/80 (2012.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01); G03F 1/46 (2013.01); G03F 1/50 (2013.01); G03F 1/80 (2013.01);
Abstract
A photomask blank comprising a transparent substrate (), an etching stop film (), a light-shielding film (), and an etching mask film () has on the substrate side a reflectance of up to 35% with respect to exposure light. The etching stop film () consists of a first layer () which is disposed contiguous to the substrate and functions as an antireflective layer and a second layer () functioning as a fluorine-base dry etching-resistant layer, one of the first and second layers is a layer having compressive stress and the other is a layer having tensile stress.