Kodaira, Japan

Sonoko Migitaka


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2004-2006

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2 patents (USPTO):Explore Patents

Title: Sonoko Migitaka: Innovator in Photomask Technology

Introduction

Sonoko Migitaka is a prominent inventor based in Kodaira, Japan. She has made significant contributions to the field of photomask technology, particularly in the context of KrF excimer laser lithography. With a total of 2 patents to her name, Migitaka's work has been instrumental in advancing semiconductor manufacturing processes.

Latest Patents

Migitaka's latest patents include innovative solutions for photomasks used in KrF excimer laser lithography. The first patent focuses on providing a photo mask that can be produced with high accuracy and low defects in fewer steps. This invention features a resist pattern that efficiently absorbs KrF excimer laser light, formed directly on a quartz substrate. The resist pattern comprises an aqueous alkali-soluble resin with a high light shielding property, incorporating a naphthol structure with at least one hydroxyl group bound to a naphthalene nucleus.

The second patent addresses the manufacturing method of a photomask, where an opaque pattern is created using a photosensitive resin composition containing a specified light absorbent. This method allows for the production of photomasks for KrF excimer laser lithography in a shorter time frame and at a reduced cost, ultimately lowering the manufacturing time and expenses for semiconductor integrated circuit devices.

Career Highlights

Sonoko Migitaka is currently employed at Renesas Technology Corporation, where she continues to innovate in the field of semiconductor technology. Her work has garnered attention for its practical applications and efficiency improvements in photomask production.

Collaborations

Migitaka has collaborated with notable colleagues such as Tadashi Arai and Hiroshi Shiraishi, contributing to the advancement of technology in her field.

Conclusion

Sonoko Migitaka is a trailblazer in photomask technology, with her patents reflecting her commitment to innovation and efficiency in semiconductor manufacturing. Her contributions are vital to the ongoing evolution of the industry.

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