The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2004
Filed:
Dec. 19, 2001
Applicant:
Inventors:
Sonoko Migitaka, Kodaira, JP;
Tadashi Arai, Kumagaya, JP;
Tsutomu Araki, Kodaira, JP;
Satoshi Momose, Higashiyamato, JP;
Osamu Yamaguchi, Takasaki, JP;
Assignee:
Renesas Technology Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
In the step of manufacturing a photomask, an opaque pattern is formed by using a photosensitive resin composition containing a specified light absorbent, which then used to manufacture a photomask for KrF excimer laser lithography in a short manufacturing time and at a reduced cost. Accordingly, the manufacturing time and the cost for semiconductor integrated circuit devices is reduced.
Migitaka, Sonoko. (2004). Photomask and manufacturing method of an electronic device therewith (U.S. Patent No. 6790564). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6790564
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile