Nirasaki, Japan

Songyun Kang

This inventor holds 5 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2013-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Songyun Kang. Retrieved from https://idiyas.com/inventor/songyun-kang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 20.0

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 13(Granted Patents)


Location History:

  • Nirasaki, JP (2013 - 2016)
  • Amagasaki, JP (2014 - 2016)

Company Filing History:


Years Active: 2013-2016

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5 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Songyun Kang

Introduction

Songyun Kang is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of five patents. His work focuses on improving etching methods and apparatuses, which are crucial in various manufacturing processes.

Latest Patents

Among his latest patents, Songyun Kang has developed an etching method, etching apparatus, and a ring member. This innovative etching process involves loading a substrate into a processing chamber and mounting it on a table. A ring member, made of the same material as the etching target film, surrounds the substrate. A processing gas is injected in a shower-like manner, and the etching target film is processed using plasma. This method effectively suppresses the unbalanced distribution of plasma active species near the circumferential edge of the substrate. Additionally, he has patented a plasma processing apparatus and method, which includes a first and second electrode positioned above a mounting table. This design allows for efficient plasma generation while minimizing damage to the substrate.

Career Highlights

Songyun Kang is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing plasma processing technologies, which are essential for the production of microelectronics.

Collaborations

Throughout his career, Songyun Kang has collaborated with notable colleagues, including Ikuo Sawada and Peter Ventzek. These collaborations have further enhanced his research and development efforts in the field of plasma processing.

Conclusion

Songyun Kang's innovative contributions to plasma processing technology have significantly impacted the semiconductor industry. His patents reflect a commitment to improving manufacturing processes and enhancing the efficiency of etching methods. His work continues to influence advancements in technology and manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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