The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Jul. 20, 2012
Ayuta Suzuki, Nirasaki, JP;
Songyun Kang, Nirasaki, JP;
Tsuyoshi Moriya, Tokyo, JP;
Nobutoshi Terasawa, Nirasaki, JP;
Yoshiaki Okabe, Toyama, JP;
Ayuta Suzuki, Nirasaki, JP;
Songyun Kang, Nirasaki, JP;
Tsuyoshi Moriya, Tokyo, JP;
Nobutoshi Terasawa, Nirasaki, JP;
Yoshiaki Okabe, Toyama, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Etching is performed through the following process. A substrate is loaded into a processing chamber and mounted on a mounting table therein. Then, in the state where a ring member at least a surface of which is made of a same material as a main component of an etching target film is provided to surround the substrate, a processing gas is injected in a shower-like manner from a gas supply unit oppositely facing the substrate and the etching target film is etched by using a plasma of the processing gas; and evacuating the inside of the processing chamber through an exhaust path. Through this process, unbalanced distribution of plasma active species in the vicinity of a circumferential edge portion of the substrate can be suppressed.