Company Filing History:
Years Active: 2024-2025
Title: The Innovations of Sol-Lee Hwang
Introduction
Sol-Lee Hwang is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of overlay measurement technology, holding a total of seven patents. His work focuses on enhancing the precision of measurements in semiconductor manufacturing.
Latest Patents
Hwang's latest patents include an innovative overlay measurement device and method designed to measure errors between overlay marks on different layers of a wafer. The first patent outlines a device that incorporates a light source, an objective lens, a lens focus actuator, an auto focus module, a detector, a transmission and receipt part, and a processor. This device is engineered to accurately measure the distance between the first and second overlay marks. The second patent also describes a similar overlay measurement device, but it includes an aperture that modifies the beam from the light source for optimal imaging of the overlay marks.
Career Highlights
Sol-Lee Hwang is currently employed at Auros Technology, Inc., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise in overlay measurement has positioned him as a key player in advancing measurement accuracy in wafer fabrication.
Collaborations
Hwang collaborates with talented colleagues such as Dong-Won Jung and Hee-Chul Lim, contributing to a dynamic team focused on innovation and technological advancement.
Conclusion
Sol-Lee Hwang's contributions to overlay measurement technology exemplify his commitment to innovation in the semiconductor field. His patents reflect a deep understanding of the complexities involved in wafer measurements, making him a valuable asset to Auros Technology, Inc.