Sicong Wang

Title: Sicong Wang: Innovator in Semiconductor Metrology

Introduction

Sicong Wang is a prominent inventor based in Wuhan, China. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on advanced systems and methods for measuring the surface topography of semiconductor chips.

Latest Patents

Wang's latest patents include innovative systems and methods for semiconductor chip surface topography metrology. One of his disclosed systems comprises a light source that provides low coherent light to a first beam splitter. A scanner uses this light to scan positions on the surface of a semiconductor chip. The system also includes a second beam splitter that receives reflected signals from these positions, along with a detector that detects interference signals corresponding to each position. Additionally, a spectrometer is utilized to detect spectrum signals from the second output of the second beam splitter, further enhancing the measurement capabilities.

Another patent focuses on measuring the surface topography of a semiconductor structure. This involves measuring a plurality of interference signals corresponding to various positions on the surface. Calibration signals are also measured, which are associated with baseline and calibrated regions. The surface height offset is determined based on these signals, allowing for a detailed characterization of the semiconductor structure's surface topography.

Career Highlights

Sicong Wang is currently employed at Yangtze Memory Technologies Co., Ltd. His work at this company has positioned him as a key player in the semiconductor industry, contributing to advancements in metrology techniques.

Collaborations

Wang collaborates with notable colleagues, including Xiaoye Ding and Yi Zhou. Their combined expertise enhances the innovative efforts within their projects.

Conclusion

Sicong Wang's contributions to semiconductor metrology demonstrate his commitment to advancing technology in this critical field. His innovative patents and collaborative efforts continue to shape the future of semiconductor manufacturing.