Location History:
- Kanagawa-ken, JP (2000 - 2001)
- Numazu, JP (2004)
- Kanagawa, JP (2009 - 2017)
- Yokohama, JP (1998 - 2022)
Company Filing History:
8 out of 52,752 
8 out of 717 
1 out of 832,891 Years Active: 1998-2022
Title: **Shusuke Yoshitake: Innovator in Mask Inspection Technology**
Introduction
Shusuke Yoshitake is a prominent inventor based in Yokohama, Japan. With a remarkable portfolio of 17 patents, he has made significant contributions to the field of semiconductor manufacturing, particularly in the area of mask inspection technology. His work is pivotal in ensuring the precision and quality of photomasks used in advanced manufacturing processes.
Latest Patents
Yoshitake's latest innovations include several cutting-edge patented technologies. Notably, he has developed a mask inspection apparatus and an electron beam inspection apparatus. The mask inspection apparatus features an image acquisition mechanism that captures optical images of patterns by utilizing inspection light directed onto EUV masks. This apparatus detects the reflection inspection light, maintaining a precise relationship between the inspection light’s incident direction and the mask's arrangement direction. Additionally, he has introduced methods for mask inspection and electron beam inspection that enhance the accuracy and efficiency of defect detection in photomasks. Other significant patents involve various apparatus and methods related to pattern inspection and measurement, aerial image measurement systems, and mask manufacturing processes.
Career Highlights
Shusuke Yoshitake has built an impressive career primarily at Kabushiki Kaisha Toshiba and Nuflare Technology, Inc. He has played a crucial role in advancing technologies that ensure high standards in semiconductor manufacturing. His expertise and innovative approach have led to the development of several key devices and methods that are essential for modern photomask inspection and manufacturing.
Collaborations
Throughout his career, Yoshitake has collaborated with esteemed colleagues, notably Ryoichi Hirano and Toru Tojo. These collaborations have strengthened his work, leading to advancements and breakthroughs in inspection technologies that are vital for the precision of semiconductor devices.
Conclusion
Shusuke Yoshitake exemplifies the spirit of innovation in the high-tech industry. With 17 patents under his name, his contributions to mask inspection technology have not only enhanced the performance of semiconductor manufacturing but also paved the way for future advancements in the field. His work, in collaboration with talented professionals, underscores the importance of teamwork and innovation in tackling the challenges of modern technology.