The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
Mar. 20, 2009
Kaoru Tsuruta, Kanagawa, JP;
Takashi Kamikubo, Tokyo, JP;
Rieko Nishimura, Kanagawa, JP;
Shusuke Yoshitake, Kanagawa, JP;
Shuichi Tamamushi, Kanagawa, JP;
Kaoru Tsuruta, Kanagawa, JP;
Takashi Kamikubo, Tokyo, JP;
Rieko Nishimura, Kanagawa, JP;
Shusuke Yoshitake, Kanagawa, JP;
Shuichi Tamamushi, Kanagawa, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A correcting substrate for a charged particle beam lithography apparatus includes a substrate body using a low thermal expansion material having a thermal expansion lower than that of a silicon oxide (SiO) material; a first conductive film arranged above the substrate; and a second conductive film selectively arranged on the first conductive film and having a reflectance higher than the first conductive film, wherein the low thermal expansion material is exposed on a rear surface of the correcting substrate.