Shunichi Mikami

Title: Shunichi Mikami: Innovator in Plasma Etching Technology

Introduction

Shunichi Mikami is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma etching technology, holding a total of 5 patents. His innovative methods have advanced the capabilities of semiconductor manufacturing processes.

Latest Patents

Mikami's latest patents include a plasma etching method, a pattern forming method, and a cleaning method. The plasma etching method involves forming a desired pattern of a mask into a film that includes a zirconium oxide film. This is achieved by plasma etching with plasma generated from a first gas, which consists of various chloride-containing gases and hydrogen-containing gases, along with a noble gas. An underlying film of silicon oxide or amorphous carbon is provided beneath the zirconium oxide film, ensuring that the etching selectivity of the zirconium oxide film to the underlying film is greater than or equal to one. Additionally, his plasma etching method and apparatus utilize a photoresist as a mask to etch a base film, switching processing conditions to optimize selectivity during the etching process.

Career Highlights

Shunichi Mikami is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on developing advanced plasma etching techniques that enhance the precision and efficiency of semiconductor fabrication.

Collaborations

Mikami has collaborated with notable coworkers such as Shigeru Senzaki and Toshikatsu Tobana. Their combined expertise has contributed to the successful development of innovative technologies in the field.

Conclusion

Shunichi Mikami's contributions to plasma etching technology have positioned him as a key figure in the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in manufacturing processes.