Location History:
- San Jose, CA (US) (1999 - 2002)
- Saratoga, CA (US) (2004 - 2005)
Company Filing History:
Years Active: 1999-2005
Title: Shumay X Dou: Innovator in Dual Damascene Structures
Introduction
Shumay X Dou is a prominent inventor based in San Jose, CA. He holds a total of 11 patents, showcasing his significant contributions to the field of semiconductor technology. His innovative work primarily focuses on methods that enhance the manufacturing processes of integrated circuits.
Latest Patents
One of Shumay's latest patents is titled "Method of preventing resist poisoning in dual damascene structures." This patent describes a method for forming a dual damascene interconnect in a dielectric layer. The process involves etching a first aperture in the dielectric, forming a poison barrier layer over part of the dielectric to prevent resist poisoning, and creating a patterned mask over the poison barrier layer. A second aperture is then etched into the dielectric layer, ensuring that at least part of the first aperture shares the same area as at least part of the second aperture.
Career Highlights
Throughout his career, Shumay has worked with notable companies such as LSI Logic Corporation and LSI Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.
Collaborations
Shumay has collaborated with several talented individuals in his field, including Joe W Zhao and Keith K Chao. These collaborations have contributed to the advancement of technology in dual damascene structures.
Conclusion
Shumay X Dou's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to shape the future of integrated circuit manufacturing.