Shuichi Samata

Title: Innovations of Shuichi Samata

Introduction

Shuichi Samata is a prominent inventor based in Saga, Japan. He has made significant contributions to the field of silicon technology, holding a total of five patents. His work focuses on methods related to the evaluation and manufacturing of silicon materials, which are crucial in various technological applications.

Latest Patents

Shuichi Samata's latest patents include a method of evaluating a silicon layer and a method of manufacturing silicon epitaxial wafers. The evaluation method involves forming an oxide film on the surface of a silicon layer, performing a charging treatment to impart a negative charge, and measuring the resistivity of the silicon layer using the van der Pauw method. Another notable patent is a method for evaluating the carbon concentration of a silicon sample. This method includes forming an oxide film on the surface of the silicon sample, irradiating it with a particle beam, and measuring the intensity of photoluminescence emitted from the sample to evaluate carbon concentration.

Career Highlights

Shuichi Samata is currently employed at Sumco Corporation, a leading company in the silicon wafer manufacturing industry. His expertise in silicon technology has positioned him as a valuable asset to the company. His innovative approaches have contributed to advancements in silicon wafer production and evaluation processes.

Collaborations

Shuichi has collaborated with notable colleagues such as Noritomo Mitsugi and Kazutaka Eriguchi. Their combined efforts in research and development have further enhanced the capabilities of silicon technology.

Conclusion

Shuichi Samata's contributions to silicon technology through his patents and work at Sumco Corporation highlight his importance in the field. His innovative methods continue to influence the manufacturing and evaluation processes of silicon materials.