Shu-Luan Chan

Title: Innovations of Shu-Luan Chan in Substrate Technology

Introduction

Shu-Luan Chan is a notable inventor based in Zhongli, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in substrate structures. With a total of 2 patents to his name, Chan's work is recognized for its innovative approaches to manufacturing and design.

Latest Patents

Chan's latest patents include advancements in substrate structures and methods for their manufacturing. One of his patents describes a substrate structure that consists of a core substrate, an interconnection portion, and a solder mask. The core substrate features a top surface and a bottom surface, with a circuit pattern disposed on the top surface. The interconnection portion includes a surface dielectric layer and a surface circuit layer that is electrically connected to the circuit pattern. Additionally, the solder mask is designed with a hole to identify the substrate structure. Another patent further elaborates on the substrate structure, emphasizing the inclusion of a hole in the surface dielectric layer that is not covered by the surface circuit layer, along with an indentation in the solder mask above the hole.

Career Highlights

Shu-Luan Chan is currently employed at Advanced Semiconductor Engineering, Inc., where he continues to innovate in the semiconductor industry. His work has contributed to the advancement of substrate technology, enhancing the efficiency and functionality of semiconductor devices.

Collaborations

Chan has collaborated with notable colleagues such as Shuo-Hsun Chang and Chi-Chih Huang. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the semiconductor field.

Conclusion

Shu-Luan Chan's contributions to substrate technology exemplify the innovative spirit of modern inventors. His patents reflect a commitment to advancing semiconductor manufacturing processes, making a lasting impact on the industry.