Shu-Hui Sung

Title: The Innovations of Shu-Hui Sung

Introduction: Shu-Hui Sung is a notable inventor based in Hsinchu County, Taiwan. She has made significant contributions to the field of integrated circuits, showcasing her expertise and innovative spirit. With one patent to her name, her work continues to influence the technology landscape.

Latest Patents: Shu-Hui Sung holds a patent for "Integrated circuits and manufacturing methods thereof." This patent describes an integrated circuit that includes a first diffusion area for a first type transistor, which consists of a first drain region and a first source region. Additionally, a second diffusion area for a second type transistor is separated from the first diffusion area. The second type transistor also includes a second drain region and a second source region. A gate electrode extends continuously across both diffusion areas in a routing direction. The design includes a first metallic structure electrically coupled with the first source region, a second metallic structure coupled with the second drain region, and a third metallic structure that is disposed over and electrically coupled with the first and second metallic structures. Notably, the width of the first metallic structure is substantially equal to or larger than that of the third metallic structure.

Career Highlights: Shu-Hui Sung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. Her role at the company allows her to apply her innovative ideas and contribute to the development of advanced technologies.

Collaborations: Some of her coworkers include Ali Keshavarzi and Ta-Pen Guo, who work alongside her in the pursuit of technological advancements.

Conclusion: Shu-Hui Sung's contributions to integrated circuit technology exemplify her innovative capabilities and dedication to her field. Her patent reflects her commitment to advancing semiconductor technology, and her work continues to inspire future innovations.