This inventor holds 3 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2019-2024.
Company Filing History:
Years Active: 2019-2024
Title: Innovations of Shu-Bin Hsu in Chemical-Mechanical Polishing
Introduction
Shu-Bin Hsu is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of chemical-mechanical polishing, with a focus on enhancing the efficiency and effectiveness of polishing systems. His innovative approaches have led to the development of several patents that are pivotal in the semiconductor manufacturing industry.
Latest Patents
Shu-Bin Hsu holds 3 patents that showcase his expertise in polishing technologies. His latest patents include a "Polishing head, chemical-mechanical polishing system and method for polishing substrate." This method involves supplying slurry onto a polishing pad and holding a wafer against the pad with a piezoelectric layer interposed between a pressure unit and the wafer. The process exerts a force on the piezoelectric layer, generating voltages that correspond to different portions of the wafer, allowing for precise tuning of the polishing force. Another patent under the same title describes a similar method where a first voltage generated by the piezoelectric layer is detected to control the pressing of the wafer against the polishing pad, ensuring optimal polishing results.
Career Highlights
Shu-Bin Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor manufacturing processes.
Collaborations
Shu-Bin Hsu has collaborated with notable colleagues such as Ren-Guei Lin and Sheng-Chen Wang. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies in the field.
Conclusion
Shu-Bin Hsu's contributions to the field of chemical-mechanical polishing are significant and impactful. His innovative patents and collaborative efforts continue to shape the future of semiconductor manufacturing.