Shoutian Li

Title: Shoutian Li: Innovator in Chemical-Mechanical Polishing Solutions

Introduction

Shoutian Li is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of chemical-mechanical polishing solutions, holding a total of 4 patents. His innovative work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Li's latest patents include a chemical-mechanical polishing liquid that features a unique combination of water, cerium oxide, polyquaternium, carboxylic acid containing a benzene ring, and polyvinylamine. This formulation allows for the true function of auto stop to be achieved when used together. The polishing rates are optimized for high step heights of patterned silicon chips, ensuring effective performance. Another notable patent is a chemical-mechanical polishing solution that contains water, cerium oxide abrasive particles, and hydroxylamine. This solution can enhance the removal rate of patterned silicon dioxide with the addition of 4-hydroxybenzoic acid or salicylhydroxamic acid.

Career Highlights

Shoutian Li has worked with notable companies such as Anji Microelectronics (Shanghai) Co., Ltd. and Anji Microelectronics Technology (Shanghai) Co., Ltd. His experience in these organizations has contributed to his expertise in the field of microelectronics and polishing solutions.

Collaborations

Li has collaborated with several professionals in his field, including Xiaoming Ren and Changzheng Jia. These partnerships have fostered innovation and development in his projects.

Conclusion

Shoutian Li's contributions to chemical-mechanical polishing solutions demonstrate his commitment to advancing technology in the semiconductor industry. His patents reflect a deep understanding of materials and processes that enhance manufacturing efficiency.