The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Dec. 03, 2020
Applicant:

Anji Microelectronics Technology (Shanghai) Co., Ltd, Shanghai, CN;

Inventors:

Xiaoming Ren, Shanghai, CN;

Changzheng Jia, Shanghai, CN;

Shoutian Li, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); B24B 1/00 (2006.01); B24B 37/04 (2012.01); C09G 1/00 (2006.01); C09G 1/04 (2006.01); C09G 1/06 (2006.01); C09K 3/14 (2006.01); C09K 13/06 (2006.01); H10P 52/40 (2026.01); H10P 95/00 (2026.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 1/00 (2013.01); B24B 37/044 (2013.01); C09G 1/00 (2013.01); C09G 1/04 (2013.01); C09G 1/06 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); C09K 13/06 (2013.01); H10P 52/40 (2026.01); H10P 52/402 (2026.01); H10P 52/407 (2026.01); H10P 95/02 (2026.01); H10P 95/06 (2026.01); H10P 95/062 (2026.01);
Abstract

Disclosed is a chemical mechanical polishing solution containing cerium oxide, polyacrylic acid, polyvinyl amine and water. In this invention polyvinyl amine can serve as an additive to reduce the dishing amount of patterned wafer by negatively charged cerium oxide, and improve the efficiency of planarization.


Find Patent Forward Citations

Ren, Xiaoming. (2026). Chemical mechanical polishing solution (U.S. Patent No. 12655319). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12655319

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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