This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignees: Anji Microelectronics (Shanghai) Co., Ltd., Anji Microelectronics Technology (Shanghai) Co., Ltd., Anji Microelectronics Technology (Shanghai) Co., Ltd.. Active years: 2025-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
2 out of 8 
1 out of 2 
1 out of 1 Years Active: 2025-2026
Title: Innovations of Xiaoming Ren in Chemical-Mechanical Polishing Solutions
Introduction
Xiaoming Ren is a notable inventor based in Shanghai, China. He has made significant contributions to the field of chemical-mechanical polishing solutions, holding a total of 4 patents. His work focuses on enhancing the efficiency and effectiveness of polishing processes used in semiconductor manufacturing.
Latest Patents
Xiaoming Ren's latest patents include innovative formulations for chemical-mechanical polishing solutions. One of his patents discloses a chemical-mechanical polishing solution that contains water, cerium oxide, polyquaternium, carboxylic acid containing a benzene ring, and polyvinylamine. This formulation achieves the function of auto stop by utilizing these components together, ensuring low polishing rates on blanks while maintaining high polishing rates on patterned silicon chips with significant step heights. Another patent reveals a chemical-mechanical polishing solution that includes water, cerium oxide abrasive particles, and hydroxylamine. This solution can further enhance the removal rate of patterned silicon dioxide with the addition of 4-hydroxybenzoic acid or salicylhydroxamic acid.
Career Highlights
Xiaoming Ren has worked with reputable companies in the microelectronics sector, including Anji Microelectronics (Shanghai) Co., Ltd. and Anji Microelectronics Technology (Shanghai) Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative polishing solutions.
Collaborations
Xiaoming has collaborated with notable coworkers such as Changzheng Jia and Shoutian Li. Their combined expertise has contributed to the advancement of chemical-mechanical polishing technologies.
Conclusion
Xiaoming Ren's contributions to the field of chemical-mechanical polishing solutions demonstrate his innovative spirit and dedication to improving semiconductor manufacturing processes. His patents reflect a deep understanding of the materials and techniques necessary for achieving optimal polishing results.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile