Tampa, FL, United States of America

Shouliang Lai

USPTO Granted Patents = 6 


Average Co-Inventor Count = 3.1

ph-index = 3

Forward Citations = 33(Granted Patents)


Company Filing History:


Years Active: 2005-2011

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Inventor Shouliang Lai

Introduction: Shouliang Lai, an accomplished inventor located in Tampa, FL, has made significant strides in the field of semiconductor technology. With a total of six patents to his name, Lai has showcased his expertise through innovative inventions that enhance etching processes in semiconductor manufacturing.

Latest Patents: Among his latest patents, two stand out for their innovative approaches. The first is a "Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processes." This invention addresses the common issue of aspect ratio dependent etching observed when plasma etching deep trenches in semiconductor substrates. By monitoring various sized features on the substrate in real time, the invention allows for the adjustment of process parameters to achieve equivalent etch depths across different sized features.

The second notable patent is for a "Method for plasma etching of positively sloped structures." This process includes placing the substrate in a vacuum chamber and executing an alternating process of deposition and etching. This innovative approach achieves specific trench depths and desired sidewall angles by introducing a combination of polymer, etchant, and scavenger containing gases into the chamber, igniting plasmas to facilitate effective etching.

Career Highlights: Shouliang Lai has contributed to significant advancements in semiconductor technology through his work at notable companies. One of his key positions was at Unaxis USA Inc., where he collaborated on various projects that further solidified his reputation as an innovator in the field.

Collaborations: Throughout his career, Lai has had the opportunity to work alongside talented professionals, including David J Johnson and Russell Westerman. Their collaborations have likely contributed valuable insights and expertise, enhancing the innovative solutions developed by Lai.

Conclusion: With a solid foundation of six patents and a focus on progressing etching processes in semiconductor manufacturing, Shouliang Lai continues to be a notable figure within the realm of invention. His contributions not only reflect his skill as an inventor but also highlight the importance of innovation in driving advancements in technology.

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