The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
Jun. 20, 2005
David Johnson, Palm Harbor, FL (US);
Russell Westerman, Largo, FL (US);
Mike Teixeira, Lutz, FL (US);
Shouliang Lai, Tampa, FL (US);
David Johnson, Palm Harbor, FL (US);
Russell Westerman, Largo, FL (US);
Mike Teixeira, Lutz, FL (US);
Shouliang Lai, Tampa, FL (US);
Unaxis USA Inc., St. Petersburg, FL (US);
Abstract
The present invention provides a method for controlling pressure in a chamber during a time division multiplexed process. A throttle valve is positioned based on an open-loop pressure control algorithm within at least one step of the time division multiplexed etch process. A pressure response of the step is evaluated and compared to a desired pressure response. The throttle valve is then positioned through a proportional, integral and derivative controller step to step of the time division multiplexed etch process based on the evaluation to the desired pressure response.