Location History:
- Osaka, JP (1989 - 1993)
- Moriguchi, JP (1993)
Company Filing History:
Years Active: 1989-1993
Title: The Innovations of Shoichiro Nakayama
Introduction
Shoichiro Nakayama is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on advancements in thin film transistors and methods for fabricating semiconductor devices.
Latest Patents
One of Nakayama's latest patents is for a thin film transistor that features a noncrystalline semiconductor film. This innovative design allows for an amorphous semiconductor in the channel area to be polycrystallized, while the surrounding areas remain amorphous. This configuration enhances the performance of the thin film transistor by creating a heterojunction between the channel area and the source and drain areas. Another notable patent involves a method of fabricating a semiconductor device. In this method, a semiconductor film is formed on a substrate, followed by the application of an insulator film. A dopant source is then arranged on the insulator film, and a high-energy beam is used to irradiate a region for electrical contact. This process melts the insulator and semiconductor films in the irradiated region, forming a polycrystalline contact region that incorporates impurities from the dopant source. This innovative approach eliminates the need for traditional patterning processes, such as etching.
Career Highlights
Shoichiro Nakayama is currently associated with Sanyo Electric Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing more efficient and effective semiconductor devices.
Collaborations
Throughout his career, Nakayama has collaborated with notable colleagues, including Shigeru Noguchi and Keiichi Sano. These collaborations have further enriched his contributions to the field.
Conclusion
Shoichiro Nakayama's innovative work in semiconductor technology has led to significant advancements in the industry. His patents reflect a commitment to improving the functionality and efficiency of semiconductor devices. His contributions will undoubtedly continue to influence the field for years to come.