Shogo Ikeura

Title: Shogo Ikeura: Innovator in Semiconductor Technology

Introduction

Shogo Ikeura is a prominent inventor based in Kariya, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing the efficiency and functionality of semiconductor devices.

Latest Patents

Ikeura's latest patents include innovative designs for semiconductor devices. One notable patent describes a semiconductor device that comprises a semiconductor substrate, a body layer, a source region, a drift layer, a drain region, a gate insulating film, and a gate electrode. This design features an active layer with an element region partitioned by a trench isolation portion. The arrangement of the source and drain regions, along with the gate insulating film, optimizes the device's performance.

Another significant patent involves a semiconductor device that incorporates a capacitor on a substrate. This design includes a wiring layer that is formed by stacking multiple insulation films and electrodes. The capacitors are connected in parallel, enhancing the device's electrical capabilities. The intermediate electrode in this design maintains a higher potential than both the lower and upper electrodes, which is crucial for its operation.

Career Highlights

Shogo Ikeura is currently employed at Denso Corporation, a leading company in the automotive technology sector. His role involves research and development in semiconductor technologies, where he applies his expertise to create innovative solutions for modern electronic systems.

Collaborations

Ikeura collaborates with talented coworkers, including Yusuke Nonaka and Shinichirou Yanagi. Together, they work on advancing semiconductor technologies and contribute to the innovative projects at Denso Corporation.

Conclusion

Shogo Ikeura is a key figure in the semiconductor industry, with a focus on developing advanced technologies that enhance device performance. His contributions through patents and collaborations reflect his commitment to innovation in this critical field.