Shogo Fukui

Title: Shogo Fukui: Innovator in Substrate Processing Technology

Introduction

Shogo Fukui is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 9 patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing methods and apparatuses.

Latest Patents

Fukui's latest patents include a substrate processing apparatus and a substrate processing method that feature an enhanced configuration for replenishing processing liquid. This innovative apparatus consists of a tank for storing processing liquid, a circulation line, and a processing part that supplies the liquid to a substrate. It also includes a discharge part to manage the storage amount of the processing liquid and a controller that ensures optimal replenishment based on specific criteria. Another notable patent involves a substrate processing apparatus designed to dry a substrate with a liquid film using supercritical fluid. This apparatus includes a processing vessel, a substrate holder, and a posture adjusting device to maintain the substrate's horizontal leveling during processing.

Career Highlights

Shogo Fukui is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has been instrumental in advancing substrate processing technologies, contributing to the efficiency of semiconductor fabrication processes.

Collaborations

Fukui has collaborated with notable colleagues, including Hidetaka Shinohara and Tomohito Ura. Their combined expertise has further propelled innovations in substrate processing technologies.

Conclusion

Shogo Fukui's contributions to substrate processing technology are noteworthy, with a focus on improving processing methods and apparatuses. His innovative patents and collaborations reflect his commitment to advancing the field.