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For the Inventor, By the Inventor

Kawasaki, Japan

Sho Abe

This inventor holds 10 USPTO granted patents. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2009-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sho Abe. Retrieved from https://idiyas.com/inventor/sho-abe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 80.0

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:

goldMedal10 out of 1,236 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents

Years Active: 2009-2015

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10 patents (USPTO):Explore Patents
1. 9005872 - Resist composition and method of forming resist pattern (2015-04-14),
2. 8859187 - Method of forming resist pattern and negative resist composition (2014-10-14),
3. 8632960 - Method of forming resist pattern and negative tone-development resist composition (2014-01-21),
4. 8541157 - Resist composition, method of forming resist pattern, compound and acid generator including the same (2013-09-24),
5. 8404426 - Negative resist composition, method of forming resist pattern and polymeric compound (2013-03-26),
6. 8236483 - Method of forming resist pattern (2012-08-07),
7. 8039199 - Negative resist composition for immersion exposure and method of forming resist pattern (2011-10-18),
8. 8034536 - Resist composition and method of forming resist pattern (2011-10-11),
9. 8021824 - Polymer compound, resist composition and method of forming resist pattern (2011-09-20),
10. 7598017 - Negative resist composition and method of forming resist pattern (2009-10-06),

Title: Innovations of Sho Abe in Resist Technology

Introduction

Sho Abe is a prominent inventor based in Kawasaki, Japan, known for his significant contributions to resist technology. With a total of 10 patents to his name, he has made remarkable advancements in the field of photolithography, which is essential for semiconductor manufacturing.

Latest Patents

Among his latest patents, Sho Abe has developed a resist composition and method of forming a resist pattern. This resist composition includes a base component that exhibits changed solubility in a developing solution under the action of acid. It also features a basic-compound component and an acid-generator component that generates acid upon exposure. His innovative method of forming a resist pattern aims to reduce thickness loss from the resist pattern, enhancing the efficiency of the manufacturing process.

Career Highlights

Sho Abe is currently employed at Tokyo Ohka Kogyo Co., Ltd., a leading company in the field of chemical products for the semiconductor industry. His work has been instrumental in advancing the capabilities of resist materials, which are critical for the production of integrated circuits.

Collaborations

Throughout his career, Sho Abe has collaborated with notable colleagues, including Jun Iwashita and Tomoyuki Hirano. These collaborations have fostered a creative environment that has led to numerous innovations in resist technology.

Conclusion

Sho Abe's contributions to resist technology have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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