Shiyu Yue

Title: **Shiyu Yue: Innovator in Semiconductor Processing**

Introduction

Shiyu Yue is a notable inventor based in Santa Clara, CA, who has contributed significantly to the field of semiconductor processing. With a total of three patents to his name, Yue stands out for his innovative approaches to enhancing semiconductor structures.

Latest Patents

Yue's latest patents demonstrate advanced methodologies in semiconductor technology. One of his inventions is titled **"Metal oxide preclean for bottom-up gapfill in MEOL and BEOL."** This patent describes a method that includes a plasma pre-treatment process to eliminate impurities in a semiconductor structure that features both a metal layer and a dielectric layer. His approach involves a selective etch process specifically designed to remove molybdenum oxide from the metal layer's surface. The selective etch process utilizes a precursor containing molybdenum chloride at elevated temperatures, followed by a post-treatment to ensure any chlorine residues are thoroughly removed.

Another significant patent is the **"One chamber multi-station selective metal removal."** This invention outlines a method for selective metal removal via gradient oxidation, incorporating several processing stations within a single chamber. Each cycle of the process involves various stages from reduction to gradient oxidation and etching, all aimed at improving the efficiency of semiconductor structure manipulation.

Career Highlights

Shiyu Yue's work primarily takes place at Applied Materials, Inc., a leading company in the semiconductor and related industries. His innovative techniques enhance the capabilities of semiconductor manufacturing, making him a vital player in this competitive field.

Collaborations

Yue collaborates with several talented individuals, including Wei Lei and Rongjun Wang, who contribute to his inventive projects. Working alongside such colleagues fosters an environment of creativity and technological advancement, which is essential in driving innovations within the semiconductor arena.

Conclusion

Shiyu Yue's contributions to semiconductor processing reflect the forefront of modern technology. His patents not only exemplify technical ingenuity but also highlight the collaborative nature of innovation in research and development. As the semiconductor industry continues to evolve, inventors like Yue will play a crucial role in pushing boundaries and enabling new possibilities.