Shirui Yu

Title: The Innovative Contributions of Shirui Yu

Introduction

Shirui Yu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of image processing, particularly in the context of semiconductor manufacturing. With a total of 2 patents, his work has garnered attention for its practical applications and innovative methodologies.

Latest Patents

Shirui Yu's latest patents include an image processing method and device for CDSEM. This invention provides a method for determining a measuring range of an image of a target pattern measured by a CDSEM machine. The process involves obtaining a first gray scale image, performing a Fourier transform to obtain a frequency spectrum distribution, filtering out certain frequency components, and determining the measuring range based on the filtered data. Another notable patent is a hotspot correction method, which accurately corrects layout patterns in hotspot regions using an ILT method, while preventing distortion in extension regions through an OPC method. This dual approach enhances the efficiency and accuracy of semiconductor patterning.

Career Highlights

Shirui Yu has worked with notable companies such as Shanghai Huali Microelectronics Corporation and Shanghai Huali Integrated Circuit Corporation. His experience in these organizations has allowed him to apply his innovative ideas in real-world applications, contributing to advancements in microelectronics.

Collaborations

Shirui has collaborated with talented individuals in his field, including Yiqun Tan and Xuan Zhao. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Shirui Yu's contributions to image processing and semiconductor technology highlight his role as an influential inventor. His patents reflect a commitment to innovation and practical solutions in the industry.