This inventor holds 5 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2011-2017.
Location History:
- Nirasaki, JP (2011 - 2013)
- Yamanashi, JP (2014 - 2017)
Company Filing History:
Years Active: 2011-2017
Title: Shinya Shima: Innovator in Plasma Processing Technology
Introduction
Shinya Shima is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 5 patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
One of Shinya Shima's latest patents is a plasma processor and plasma processing method. This invention features an etching chamber that incorporates a focus ring surrounding a semiconductor wafer positioned on a lower electrode. The plasma processor is equipped with an electric potential control DC power supply, which regulates the electric potential of the focus ring. The lower electrode is supplied with a DC voltage, typically between -400 to -600 V, to control the electric potential of the focus ring. This innovative design prevents surface arcing from developing along the surface of the substrate being processed.
Career Highlights
Shinya Shima has established himself as a key figure in the semiconductor industry through his work at Tokyo Electron Limited. His expertise in plasma processing has led to advancements that improve manufacturing processes and product quality.
Collaborations
Shinya Shima has collaborated with notable colleagues, including Kaoru Oohashi and Takehiro Ueda. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the field.
Conclusion
Shinya Shima's contributions to plasma processing technology exemplify his dedication to innovation in the semiconductor industry. His patents and collaborative efforts continue to influence advancements in manufacturing processes.